February 25, 2026 to March 4, 2026
HSE Study Center “Voronovo”
Europe/Moscow timezone

Dependence Of Chemically Etched Reflective-Layer Thickness In Scintillator Strips On Light Yield

Mar 1, 2026, 8:00 PM
2h
HSE Study Center “Voronovo”

HSE Study Center “Voronovo”

Voronovskoe, Moscow Russian Federation
Board: E7
Poster (A1 portrait) Young Scientist Forum Poster Session

Speaker

Ozoda Inoyatillo (Joint Institute for Nuclear Research, Lomonosov Moscow State University)

Description

The aim of this work is to determine the optimal chemical-etching exposure time required to produce an efficient reflective surface on scintillator strips. To achieve this goal, we investigated the light yield efficiency, optical transparency, and reflectivity of strips with varying reflective-layer thicknesses formed through controlled chemical etching. Light yield measurements were performed at a fixed distance between the trigger counters and the photomultiplier tube for strips exhibiting systematically varied reflective-surface thicknesses. Systems assembled from such strips are employed in high-energy physics experiments to detect charged particles. In particular, in the Mu2e and COMET experiments, events with cosmic muons registered by such systems are excluded from further data analysis.

Primary author

Ozoda Inoyatillo (Joint Institute for Nuclear Research, Lomonosov Moscow State University)

Co-authors

Akram Artikov (Joint Institute for Nuclear Research) Davit Chokheli (Joint Institute for Nuclear Research) Ilya Vasilyev (Joint Institute for Nuclear Research) Vladimir Baranov (Joint Institute for Nuclear Research) Yury Davydov (Joint Institute for Nuclear Research)

Presentation materials